IBM®
Skip to main content
    Country/region [select]      Terms of use
 
 
   
     Home      Products      Services & solutions      Support & downloads      My account     
Technology/innovation
Microelectronics 101
Making semiconductors
Interconnect
Breakthroughs

Technology breakthroughs


IBM's technology breakthroughs include:

  • Silicon germanium increases speed, reduces electronic noise, and lowers power supply requirements. These chips can potentially integrate multiple functions, such as cell-phone, e-mail, and Internet access on a single chip.
  • Copper wires transmit electrical signals faster than aluminum in thinner, narrower wires necessary for the ever-shrinking universe of semiconductors. Enables a 40 percent improvement in conductivity. Copper-based chips can help Network Infrastructure companies create larger networks and pack more functions into their systems.
  • Silicon-on-insulator (SOI) reduces transistor capacitance, producing a 35 to 70 percent power reduction without loss of performance.
  • A new method for building microchips using a material known as "low-k dielectric" meticulously shields millions of individual copper circuits on a chip, reducing electrical "crosstalk" between wires that can hinder chip performance and waste power. This is especially important because of the need to meet the high-performance, low-power demands of next-generation equipment and Internet servers.
 
Breakthroughs
New technologies 
Aluminum to Copper 
Silicon-on-Insulator 
Silicon Germanium (SiGe) 
Low-k Dielectric 




    About IBM Privacy Contact